バイアス電圧制御型高周波グロー放電励起源の分光特性と発光分析への応用

• 我妻 和明

  東北大学金属材料研究所

書誌事項

タイトル別名

• Regulating of bias voltage of a r.f.-powered glow discharge excitation source and the emission characteristics.
• バイアス デンアツ セイギョガタ コウシュウハ グロー ホウデンレイキゲン ノ ブンコウ トクセイ ト ハッコウ ブンセキ エ ノ オウヨウ

抄録

A method to control the bias voltage of r.f.-powered glow discharge plasmas was investigated to improve the detection power in optical emission spectrometry. D.C. voltages applied with an external power supply can induce greater voltage drops at the cathode sheath, thus leading to an increase in the sputtering rate. Further, the voltages also help promote excitation and ionization processes occurring in the plasma; therefore, the emission intensities excited by the plasma are elevated. The detection limit, which was defined as the sample concentration corresponding to three-times the standard deviation of the background intensity, was estimated to be 2.6 × 10 ^-3m/m% Cu in Fe-Cu binary alloys for Cu I 327.40 nm, when the Ar pressure, the r.f. power, and the d.c. external voltage were set at 800 Pa(6 Torr), 70 W, and 450 V, respectively.

収録刊行物

• 分析化学

  分析化学 48 (1), 95-101, 1999

  公益社団法人 日本分析化学会

キーワード

• optical emission spectrometry
• r.f.-powered glow discharge plasma
• bias voltage control
• self-bias voltage
• emission intensity
• detection limit

詳細情報

• CRID: 1390282679028347136
• NII論文ID: 110002905631
• NII書誌ID: AN00222633
• DOI: 10.2116/bunsekikagaku.48.95
• COI: 1:CAS:528:DyaK1MXkslahug%3D%3D
• NDL書誌ID: 1951250
• ISSN: 05251931
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I1951250
• Web Site: http://www.jstage.jst.go.jp/article/bunsekikagaku1952/48/1/48_1_95/_pdf
• Web Site: http://dl.ndl.go.jp/info:ndljp/pid/10894441
• 本文言語コード: ja
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