The Influence of Albumin on Corrosion Resistance of Titanium in Fluoride Solution
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- IDE Katsuhisa
- Department of Dental Materials Science, Tokyo Dental College
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- HATTORI Masayuki
- Department of Dental Materials Science, Tokyo Dental College
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- YOSHINARI Masao
- Department of Dental Materials Science, Tokyo Dental College
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- KAWADA Eiji
- Department of Dental Materials Science, Tokyo Dental College
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- ODA Yutaka
- Department of Dental Materials Science, Tokyo Dental College
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抄録
Proteins can interact with corrosion reactions in several ways. In this study, we investigated the effect of albumin on the corrosion resistance of titanium in the presence of fluoride. The effects of the NaF concentration, albumin concentration, and pH on the corrosion characteristics of commercially pure titanium (CP-Ti) were examined by means of electrochemical techniques.<br>The corrosion resistance of titanium decreased as the NaF concentration increased and as pH decreased. The corrosion resistance of titanium in NaF solutions was improved in the presence of albumin. The natural electrode potential was elevated, and the passive current density was reduced by albumin at a concentration of 0.01%. The polarization resistance rose with increased concentrations of albumin in fluoride solution. These results showed that the albumin in saliva and dental plaque affected the corrosion resistance of CP-Ti in fluoride solution.
収録刊行物
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- Dental Materials Journal
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Dental Materials Journal 22 (3), 359-370, 2003
一般社団法人 日本歯科理工学会
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詳細情報 詳細情報について
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- CRID
- 1390001204716649984
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- NII論文ID
- 110002983654
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- NII書誌ID
- AA10443149
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- COI
- 1:CAS:528:DC%2BD3sXpvFensbc%3D
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- ISSN
- 18811361
- 02874547
- http://id.crossref.org/issn/02874547
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- PubMed
- 14621001
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- Crossref
- PubMed
- NDL-Digital
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可