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- NAKATANI Toshifumi
- Devices Development Center, Matsushita Electric Industrial Co., Ltd.
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- OGAWA Koichi
- Devices Development Center, Matsushita Electric Industrial Co., Ltd.
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- ITOH Junji
- RF-Semiconductor Development Center, Semiconductor Company, Matsushita Electric Industrial Co., Ltd.
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- IMANISHI Ikuo
- RF-Semiconductor Development Center, Semiconductor Company, Matsushita Electric Industrial Co., Ltd.
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A three-mode switched-LNA has been developed using a 0.25μm SiGe BiCMOS technology. The LNA features low noise figure (NF) performance, while achieving both low dissipation power and low distortion characteristics. The proposed MOSFET switch incorporating a newly developed switch circuit with a triple-well structure, which changes the LNA's mode, provides a parasitic capacitance of just 0.52 times that of a conventional MOSFET switch. This results in a significant NF improvement, by 0.16-0.33 dB, for the three-mode switched-LNA compared to a conventional LNA. Extensive studies of the MOSFET switch with regard to the structural parameters and the doping profiles are reported. Experimental results and the overall performance of a trial IC incorporating the three-mode switched-LNA are also given.
収録刊行物
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- IEICE transactions on electronics
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IEICE transactions on electronics 86 (6), 1032-1040, 2003-06-01
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詳細情報 詳細情報について
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- CRID
- 1573105977154314496
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- NII論文ID
- 110003223538
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- NII書誌ID
- AA10826283
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- ISSN
- 09168524
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- 本文言語コード
- en
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- データソース種別
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- CiNii Articles