有機多層薄膜形成での選択的結晶成長  [in Japanese] Selective Crystal Growth in Organic Multilayer Formation  [in Japanese]

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Abstract

3種類のアルカリハライド基板上に形成した有機材料によるヘテロ二層薄膜の構造とエピタキシーを調べた。これらの薄膜は真空蒸着法により作製した。有機二層薄膜の結晶配向と相互位置関係は、透過型電子顕微鏡(TEM)と原子間力顕微鏡(AFM)により調べた。観察の結果、有機材料の組み合わせおよび積層順序により3種類の積層形態が確認された。成長モードの1つである選択的重畳結晶成長は有機超格子作製において重要な現象である。そのような選択性を生じる原因としては、二層の格子整合性のみでなく、結晶表面のトポロジカルな効果が推測された。

Structure and epitaxy of hetero double layers of organic materials formed on three kinds of alkali halides were investigated. These films were fabricated by vacuum deposition. Crystallographic orientation and mutual registration of organic double layers were examined by transmission electron microscopy(TEM) and atomic force microscopy(AFM). As concluded from these observations, we found three kinds of growth modes as for the second layers depending on the combination of materials. Selective on-top growth, one of the three growth modes, is important phenomenon for fabrication of organic-superlattice. Such selectivity originates not only in lattice matching between the two layers but also in surface topography of the first layers.

Journal

Technical report of IEICE. OME   [List of Volumes]

Technical report of IEICE. OME 98(168), 17-22, 1998-07-06  [Table of Contents]

The Institute of Electronics, Information and Communication Engineers

References:  5

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Codes

  • NII Article ID (NAID) :
    110003301000
  • NII NACSIS-CAT ID (NCID) :
    AN10013334
  • Text Lang :
    JPN
  • Article Type :
    ART
  • Databases :
    CJP  NII-ELS