Advances in Enhanced Boiling Heat Transfer From Electronic Components(<Special Issue>Emerging Fields in Thermal Engineering)

    • WEI Jinjia
    • Institute for Energy Utilization, National Institute of Advanced Industrial Science and Technology

Abstract

This paper reviews recent advances in enhancing boiling heat transfer from electronic components immersed in dielectric liquids by use of surface microstructures. The microstructures developed include rough surfaces produced by sanding, vapor blasting hard particles, sputtering of Si0_2 followed by wet etching of the surface, chemical vapor deposition of SiO_2 film etc., laser-drilled cavities, a brush-like structure (dendritic structure), reentrant and micro-reentrant cavities, microfins, and porous structures fabricated by alumina particle spraying and painting of silver flakes, diamond particles, aluminum particles and copper particles. Heat sink studs with drilled holes, microfins, multi-layered micro-channels and pores, and pin fins with and without microporous coating have also been developed. The height of microstructure ranges from 0 to 12 mm. The primary issues discussed are the mitigation of temperature overshoot at boiling incipience, enhancement of nucleate boiling heat transfer and increasing the critical heat flux.

Journal

JSME international journal. Ser. B, Fluids and thermal engineering   [List of Volumes]

JSME international journal. Ser. B, Fluids and thermal engineering 46(4), 479-490, 2003-11-15  [Table of Contents]

The Japan Society of Mechanical Engineers

References:  38

You must have a user ID to see the references.If you already have a user ID, please click "Login" to access the info.New users can click "Sign Up" to register for an user ID.

Preview

Preview

Codes

  • NII Article ID (NAID) :
    110003479176
  • NII NACSIS-CAT ID (NCID) :
    AA10888815
  • Text Lang :
    ENG
  • Article Type :
    REV
  • ISSN :
    13408054
  • NDL Article ID :
    6744991
  • NDL Source Classification :
    ZN11(科学技術--機械工学・工業)
  • NDL Call No. :
    Z53-Y271
  • Databases :
    CJP  NDL  NII-ELS  J-STAGE