Effect of Oxide Charge Density in Passivation Films on Breakdown Voltage of Planar Diodes
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- Ito Satoru
- Semiconductor and Integrated Circuits Division, Hitachi, Ltd.
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- Ota Masataka
- Semiconductor and Integrated Circuits Division, Hitachi, Ltd.
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- Yamada Eiichi
- Semiconductor and Integrated Circuits Division, Hitachi, Ltd.
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- Sugawara Katsuro
- Semiconductor and Integrated Circuits Division, Hitachi, Ltd.
この論文をさがす
収録刊行物
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- Japanese Journal of Applied Physics
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Japanese Journal of Applied Physics 14 (5), 733-734, 1975
社団法人応用物理学会
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詳細情報 詳細情報について
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- CRID
- 1570854177399564032
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- NII論文ID
- 110003894922
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- NII書誌ID
- AA00690800
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- ISSN
- 00214922
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- 本文言語コード
- en
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- データソース種別
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- CiNii Articles