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- Yamakawa Kohji
- Department of Material Physics, Faculty of Engineering Science, Osaka University
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- Tada Masato
- Department of Material Physics, Faculty of Engineering Science, Osaka University
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- Fujita F. Eiichi
- Department of Material Physics, Faculty of Engineering Science, Osaka University
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The recovery process of hydrogen dissolved in excess in nickel is studied by means of the liquid hydrogen quenching method which is a modified Schultz’s method. A recovery stage of electrical resistance is found in the range 190K∼380K in the isochronal annealing curves. It is found that during the annealing the dissolved hydrogen atoms diffuse to and escape out of the surface of the specimen producing the timewise and spacewise varying distribution of concentration in the interior. The resistance of the specimen is calculated by using an equivalent circuit of the parallel connection of concentric hollow cylinders having different values of electrical resistivity depending on the hydrogen concentration which can be obtained from the diffusion equation. Extremely good agreement is obtained between the experiment and calculation, and the diffusion coefficient is determined as D=2.14×10−3exp(−8880⁄RT) cm2/sec.
収録刊行物
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- Japanese Journal of Applied Physics
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Japanese Journal of Applied Physics 15 (5), 769-776, 1976
The Japan Society of Applied Physics
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詳細情報 詳細情報について
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- CRID
- 1390282681245763328
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- NII論文ID
- 110003895368
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- NII書誌ID
- AA00690800
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- COI
- 1:CAS:528:DyaE28Xls1GjtLk%3D
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- ISSN
- 13474065
- 00214922
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可