Damage in ZnO Film Preparation by Planar Magnetron Sputtering System with Obliquely Facing Targets of Zn

• Tominaga Kikuo

  Faculty of Engineering, The University of Tokushima

• Sueyoshi Yasuhiko

  Faculty of Engineering, The University of Tokushima

• Shirai Masaki

  Faculty of Engineering, The University of Tokushima

• Imai Hiroshi

  Faculty of Engineering, The University of Tokushima

抄録

ZnO films were prepared by a sputtering system having two obliquely facing Zn targets. It was found that the influence of film bombardment by energetic particles such as O⁻ and O was observed at lower gas pressures. To prepare highly c-axis-oriented ZnO films, the inclination angle of the two targets should be limited to angles such that direct film bombardment by the energetic particles becomes small.

収録刊行物

• Japanese Journal of Applied Physics

  Japanese Journal of Applied Physics 31 (6), 1868-1869, 1992

  社団法人応用物理学会

キーワード

• film damage
• energetic particles
• planar magnetron sputtering
• facing targets

詳細情報

• CRID: 1573387452178051584
• NII論文ID: 110003900794
• NII書誌ID: AA10457675
• 本文言語コード: en
• データソース種別:
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