Effect of Degree of Imidization in Polyimide Thin Films Prepared by Vapor Deposition Polymerization on the Electrical Conduction

• Ito Yasuhiko

  Department of Electrical Engineering, Nagoya University

• Hikita Masayuki

  Department of Electrical Engineering, Nagoya University

• Kimura Toyoaki

  Department of Synthetic Chemistry Faculty of Engineering, Nagoya University

• Mizutani Teruyosi

  Department of Electrical Engineering, Nagoya University

抄録

Polyimide (PI) thin films of about 300 nm in thickness are fabricated by vapor deposition polymerization (VDP) from pyromellitic dianhydride (PMDA) and 4,4′-diaminodiphenylether (DDE). The structure of the films obtained is analyzed by means of infrared absorption spectra (IR spectra) and X-ray diffraction. The IR spectra show that the films are changed into PI by curing through the precursor, polyamic acid (PAA). The relation between the imidization of the films and the electrical conduction is examined. The results show that as imidization caused by curing the films proceeds, the current is decreased. It is therefore suggested that the residual PAA in PI thin films affects the electrical conduction. An attempt is also made to apply a model of ionic hopping conduction to the electrical conduction data.

収録刊行物

• Japanese Journal of Applied Physics

  Japanese Journal of Applied Physics 29 (6), 1128-1131, 1990

  社団法人応用物理学会

キーワード

• vapor deposition polymerization
• polyimide thin film
• electrical conduction
• polyamic acid precursor
• IR spectra
• imidization

詳細情報

• CRID: 1573105977201146496
• NII論文ID: 110003901933
• NII書誌ID: AA10457675
• 本文言語コード: en
• データソース種別:
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