Fabrication of Lead Titanate Thin Film by Laser Ablation with Alternate Deposition of Lead Oxide and Titanium Oxide Precursors (<Special Issue> FERROELECTRIC MATERIALS AND THEIR APPLICATIONS)

Preferentially oriented PbTiO_3 thin films have been deposited on Si and Pt substrates by the laser ablation method using an ArF excimer laser. First, PbO and TiO_2 ceramic targets are evaporated alternately, and PbTiO_3 film is prepared on a Si substrate with natural oxide in a fixed stoichiometric ratio which was achieved by controlling the number of irradiation pulses. The obtained film shows a preferred a-axis orientation. Secondly, a TiO_2 buffer layer is formed on Si a substrate with natural oxide. The lead lanthanum titanate (PLT) film deposited on this buffered layer has a preferred a-axis orientation.