Effects of the Annealing in Ar and H2/Ar Ambients on the Microstructure and the Electrical Resistivity of the Copper Film Prepared by Chamical Vapor Deposition

• Sa-Kyun Rha

• Won-Jun Lee

• Seung-Yun Lee

書誌事項

タイトル別名

• Effects of the Annealing in Ar and H2 A

抄録

コレクション : 国立国会図書館デジタルコレクション > デジタル化資料 > 雑誌

収録刊行物

• Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP

  Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP 35 (11), 5781-5786, 1996-11

  Tokyo : Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physics

詳細情報

• CRID: 1520853833081700480
• NII論文ID: 110003904939
• NII書誌ID: AA10457675
• ISSN: 00214922
• NDL書誌ID: 4090519
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I4090519
• 本文言語コード: en
• NDL 雑誌分類:
  • ZM35(科学技術--物理学)
• データソース種別:
  • NDL
  • CiNii Articles