Kinetics and Depth Distributions of Oxygen Implanted into Si Analyzed by the Monte Carlo Simulation of Extended TRIM.

• Yoneda Tomoaki

  Ion Engineering Research Institute Corporation, Hirakata, Osaka 573–01, Japan

• Kajiyama Kenji

  Ion Engineering Research Institute Corporation, Hirakata, Osaka 573–01, Japan

• Tohjou Fumiyo

  Matsushita TechnoResearch Incorporation, Moriguchi, Osaka 570, Japan

• Yoshioka Yoshiaki

  Matsushita TechnoResearch Incorporation, Moriguchi, Osaka 570, Japan

• Ikeda Atsushi

  Department of Physics, Ritsumeikan University Kusatsu, Shiga 525–77, Japan

• Kisaka Yoshiaki

  Department of Physics, Ritsumeikan University Kusatsu, Shiga 525–77, Japan

• Nishimura Tomoaki

  Department of Physics, Ritsumeikan University Kusatsu, Shiga 525–77, Japan

• Kido Yoshiaki

  Department of Physics, Ritsumeikan University Kusatsu, Shiga 525–77, Japan

Bibliographic Information

Other Title

• Kinetics and Depth Distributions of Oxy

Abstract

We precisely measure the depth profiles of 50-200 keV ¹⁸O⁺ implanted into Si and SiO₂ by secondary ion mass spectrometry (SIMS) and then best-fit the on. The O-profiles derived from the RBS analysis are compared with those calculated by the extended TRIM. The present analysis revealed that the O-atoms implanted at 550^° C migrated toward the surface before reaching the stoichiometry ( SiO₂). The diffusion coefficient was estimated to be about 1× 10^-14 cm²/ s, which was about 2 orders of magnitude larger than the value for ¹⁶O in crystalline Si at 550^° C. This is possibly due to the induced dense defects distributed from the mean depth of ¹⁶O toward the surface (enhanced diffusion).

Journal

• Japanese Journal of Applied Physics

  Japanese Journal of Applied Physics 36 (12A), 7323-7328, 1997

  The Japan Society of Applied Physics

Keywords

• martensitic transformation
• morphology
• nucleation and growth mechanism
• magnetic field
• hydrostatic pressure
• athermal process
• isothermal process

Details

• CRID: 1390001206248180864
• NII Article ID: 210000042084
• NII Article ID: 110003906047
• NII Book ID: AA10457675
• DOI: 10.1143/jjap.36.7323
• ISSN: 13474065
• ISSN: 00214922
• NDL BIB ID: 4371543
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I4371543
• Web Site: https://iopscience.iop.org/article/10.1143/JJAP.36.7323
• Web Site: https://iopscience.iop.org/article/10.1143/JJAP.36.7323/pdf
• Text Lang: en
• Data Source:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
• Abstract License Flag: Disallowed