Stress-Induced Raman Frequency Shift in CuInSe<sub>2</sub> Thin Films Prepared by Laser Ablation
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- Taguchi Isao
- Department of Physics, Shimane Medical University, Izumo 693, Japan
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- Ezumi Hiromichi
- Department of Electrical Engineering, Hiroshima–Denki Institute of Technology, Hiroshima 739–03, Japan
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- Keitoku Susumu
- Hiroshima Women"s University, Hiroshima 734, Japan
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- Tamaru Takeyoshi
- Department of Electrical Engineering, Hiroshima–Denki Institute of Technology, Hiroshima 739–03, Japan
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- Osono Hiroto
- Department of Electrical Engineering, Hiroshima–Denki Institute of Technology, Hiroshima 739–03, Japan
書誌事項
- タイトル別名
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- Stress-Induced Raman Frequency Shift in CuInSe2 Thin Films Prepared by Laser Ablation.
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抄録
Thin films of CuInSe2 have been prepared by laser ablation using a Nd:YAG laser at substrate temperatures up to 450° C. Raman scattering experiments have shown that the frequency of the A1 phonon mode for these films shifts markedly to higher frequencies similarly with CuInSe2 single crystals under compression. The existence of compressive stress in the films has been confirmed by observing the bending of a cover glass used as substrate. The magnitude and temperature dependence of the stress estimated from the frequency shifts agree with those determined from the degree of bending.
収録刊行物
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- Japanese Journal of Applied Physics
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Japanese Journal of Applied Physics 34 (1B), L135-L137, 1995
The Japan Society of Applied Physics
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詳細情報 詳細情報について
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- CRID
- 1390282681224035456
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- NII論文ID
- 110003922703
- 210000038479
- 130004520880
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- NII書誌ID
- AA10650595
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- ISSN
- 13474065
- 00214922
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- 本文言語コード
- en
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- データソース種別
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- JaLC
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- CiNii Articles
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- 抄録ライセンスフラグ
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