Mass- and Electron-Spectroscopic Observation of Resist Decomposition by Synchrotron Radiation
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- Ichimura Shingo
- Electrotechnical Laboratory
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- Hirata Masahiro
- Electrotechnical Laboratory
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- Tanino Hiroshi
- Electrotechnical Laboratory
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- Atoda Nobufumi
- Electrotechnical Laboratory
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- Hoh Koichiro
- Electrotechnical Laboratory
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- Ono Masatoshi
- Electrotechnical Laboratory
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Analytical techniques of mass- and electron-spectroscopy were applied to the observation of lithography by synchrotron radiation (SR). During the exposure of positive resist to SR, the tendency of side-chain components easily dissociating was shown by mass spectroscopy. In-situ analysis with electron spectroscopy showed that the height of a peak appearing at low energy increased during the exposure when the power density of SR was high. This increase was closely related to the reduction in the film thickness by SR due to the dissociation of constituent molecules of the resist.
収録刊行物
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- Japanese Journal of Applied Physics
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Japanese Journal of Applied Physics 22 (7), L406-L408, 1983
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詳細情報 詳細情報について
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- CRID
- 1570291227383228672
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- NII論文ID
- 110003929233
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- NII書誌ID
- AA10650595
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- 本文言語コード
- en
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- データソース種別
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- CiNii Articles