Mass- and Electron-Spectroscopic Observation of Resist Decomposition by Synchrotron Radiation

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Analytical techniques of mass- and electron-spectroscopy were applied to the observation of lithography by synchrotron radiation (SR). During the exposure of positive resist to SR, the tendency of side-chain components easily dissociating was shown by mass spectroscopy. In-situ analysis with electron spectroscopy showed that the height of a peak appearing at low energy increased during the exposure when the power density of SR was high. This increase was closely related to the reduction in the film thickness by SR due to the dissociation of constituent molecules of the resist.

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詳細情報 詳細情報について

  • CRID
    1570291227383228672
  • NII論文ID
    110003929233
  • NII書誌ID
    AA10650595
  • 本文言語コード
    en
  • データソース種別
    • CiNii Articles

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