Current Injection Effects in a Nb/AlO<sub>x</sub>-Al/Nb/n-InSb Triode

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<jats:p> A Nb/AlO<jats:sub> <jats:italic>x</jats:italic> </jats:sub>-Al/Nb/n-InSb triode has been fabricated and tested. The device is made on the (100) surface of undoped n-type InSb. The fabrication process is similar to that for Nb/Al-AlO<jats:sub> <jats:italic>x</jats:italic> </jats:sub>/Nb Josephson junctions. The transfer efficiency for injected electrons through a 240 nm thick Nb base layer was measured to be 1.6×10<jats:sup>-4</jats:sup> at 4.2 K. </jats:p>

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