Current Injection Effects in a Nb/AlO<sub>x</sub>-Al/Nb/n-InSb Triode
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抄録
<jats:p> A Nb/AlO<jats:sub> <jats:italic>x</jats:italic> </jats:sub>-Al/Nb/n-InSb triode has been fabricated and tested. The device is made on the (100) surface of undoped n-type InSb. The fabrication process is similar to that for Nb/Al-AlO<jats:sub> <jats:italic>x</jats:italic> </jats:sub>/Nb Josephson junctions. The transfer efficiency for injected electrons through a 240 nm thick Nb base layer was measured to be 1.6×10<jats:sup>-4</jats:sup> at 4.2 K. </jats:p>
収録刊行物
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- Japanese Journal of Applied Physics
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Japanese Journal of Applied Physics 24 (9A), L709-, 1985-09-01
IOP Publishing
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詳細情報 詳細情報について
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- CRID
- 1360847871768617472
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- NII論文ID
- 110003929920
- 210000024314
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- NII書誌ID
- AA10457675
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- ISSN
- 13474065
- 00214922
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- データソース種別
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