Preparation of Thermochromic VO<sub>2</sub>Thin Films on Fused Silica and Soda-lime Glass by RF Magnetron Sputtering
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- Wang Xuejin
- Institute of Physics, Chinese Academy of Science, P. O. Box 603, 100080, Beijing, China
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- Xu Jinjie
- Institute of Physics, Chinese Academy of Science, P. O. Box 603, 100080, Beijing, China
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- Fei Yunjie
- Institute of Physics, Chinese Academy of Science, P. O. Box 603, 100080, Beijing, China
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- Li Dehua
- Institute of Physics, Chinese Academy of Science, P. O. Box 603, 100080, Beijing, China
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- Li Tiejin
- Institute of Physics, Chinese Academy of Science, P. O. Box 603, 100080, Beijing, China
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- Nie Yuxin
- Institute of Physics, Chinese Academy of Science, P. O. Box 603, 100080, Beijing, China
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- Feng Kean
- Institute of Physics, Chinese Academy of Science, P. O. Box 603, 100080, Beijing, China
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- Wu Naijuan
- Space Vacuum Epitaxy Center, University of Houston, Houston, TX 77204-5507, USA
書誌事項
- タイトル別名
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- Preparation of Thermochromic VO2 Thin Films on Fused Silica and Soda-lime Glass by RF Magnetron Sputtering.
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抄録
The VO2 thin films were deposited on fused silica and soda-lime glass by RF magnetron sputtering and characterized by X-ray diffraction (XRD) and BIORAD FTS 6000 spectrometer. The influence of stress on the phase transition temperature and shape was also discussed.
収録刊行物
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- Japanese Journal of Applied Physics
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Japanese Journal of Applied Physics 41 (1), 312-313, 2002
The Japan Society of Applied Physics
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キーワード
詳細情報 詳細情報について
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- CRID
- 1390001206257439232
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- NII論文ID
- 210000051393
- 110004043327
- 130004528983
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- NII書誌ID
- AA10457675
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- ISSN
- 13474065
- 00214922
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可