Blue-Emitting Eu〔2+〕-Doped CaAl2O4 Phosphor Thin Films Prepared Using Pulsed Laser Deposition Technique with Post Annealing

• Kunimoto Takashi

  Department of Electrical and Electronic Engineering, Tottori University, Koyama, Tottori 680-8552, Japan

• Kakehi Ken-nosuke

  Department of Electrical and Electronic Engineering, Tottori University, Koyama, Tottori 680-8552, Japan

• Yoshimatsu Ryo

  Department of Electrical and Electronic Engineering, Tottori University, Koyama, Tottori 680-8552, Japan

• Ohmi Koutoku

  Department of Electrical and Electronic Engineering, Tottori University, Koyama, Tottori 680-8552, Japan

• Tanaka Shosaku

  Department of Electrical and Electronic Engineering, Tottori University, Koyama, Tottori 680-8552, Japan

• Kobayashi Hiroshi

  Department of Electrical and Electronic Engineering, Tottori University, Koyama, Tottori 680-8552, Japan

書誌事項

タイトル別名

• Blue-Emitting Eu2+-Doped CaAl2O4 Phosphor Thin Films Prepared Using Pulsed Laser Deposition Technique with Post Annealing.
• Blue-Emitting Eu²⁺-Doped CaAl₂O₄ Phosphor Thin Films Prepared Using Pulsed Laser Deposition Technique with Post Annealing

抄録

Blue-emitting Eu²⁺-doped calcium aluminate phosphor thin films were obtained using the pulsed laser deposition technique with post annealing. As-deposited films were amorphous and showed weak red Eu³⁺ photoluminescence (PL). By annealing in reducing atmosphere (N₂/H₂:2% mixed gas) at 950°C for 3 h, the film was crystallized and showed a PL emission band peaking at about 447 nm, which originated from the 4f⁶5d to 4f⁷ transition of Eu²⁺ ion. It is considered that the deposited film consists mainly of CaAl₂O₄ and partly of other binary compounds of the CaO-Al₂O₃ system. It was determined that the PL intensity of Eu²⁺ in CaAl₂O₄ can be controlled by the laser fluence, target-substrate distance and injection gas.

収録刊行物

• Japanese Journal of Applied Physics

  Japanese Journal of Applied Physics 40 (10B), L1126-L1128, 2001

  The Japan Society of Applied Physics

キーワード

• phosphor thin film
• PLD
• complex oxide
• flat panel display

詳細情報

• CRID: 1390282681227925888
• NII論文ID: 210000050505
• NII論文ID: 110004085407
• NII論文ID: 130004527997
• NII書誌ID: AA10650595
• DOI: 10.1143/jjap.40.l1126
• ISSN: 13474065
• ISSN: 00214922
• NDL書誌ID: 5940642
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I5940642
• Web Site: https://iopscience.iop.org/article/10.1143/JJAP.40.L1126
• Web Site: https://iopscience.iop.org/article/10.1143/JJAP.40.L1126/pdf
• 本文言語コード: en
• データソース種別:
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• 抄録ライセンスフラグ: 使用不可