Effect of annealing on the microstructure of FePt thin film

• MURAYAMA Norio

  Faculty of Science and Engineering, Chuo Univ.

• TAKAHASHI Yoshio

  Central Research Lab., Hitachi, Ltd.

• FUTAMOTO Masaaki

  Faculty of Science and Engineering, Chuo Univ.

抄録

FePt-alloy thin films sputter deposited at room temperature on surface oxidized Si substrates were annealed at 300-500℃ in vacuum. The film microstructure was observed by using a transmission electron microscope (TEM) in the plan-view and the cross-sectional view to investigate the crystal grain growth and the ordering processes of FePt-alloy thin film. The results show that atom rearrangement in the crystal grain is going on while increasing the crystal grain diameter.

収録刊行物

• 電子情報通信学会技術研究報告. MR, 磁気記録

  電子情報通信学会技術研究報告. MR, 磁気記録 106 (335), 73-74, 2006-11-02

  一般社団法人電子情報通信学会

キーワード

• FePt
• thin film media
• TEM
• microstructure

詳細情報

• CRID: 1573950401578586880
• NII論文ID: 110005717319
• NII書誌ID: AN10013050
• 本文言語コード: en
• データソース種別:
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