性能指数に基づくオンチップ配線技術評価 : 長距離配線における伝送線路配線の有効性(配線・実装技術と関連材料技術) On-Chip Differential-Transmission-Line (DTL) Interconnect for 22nm Technology

Abstract

本稿では,性能評価指標(FoM:figure of merit)を用いたオンチップ配線線路の評価結果について報告する.RC配線,オンチップ差動伝送線路配線,カーボンナノチューブ配線,光配線について,伝送遅延および消費電力の観点から比較を行う.90nmおよび22nmテクノロジーノードを想定する.比較の結果,22nmテクノロジーノードでは,0.3mm以上の配線において,オンチップ差動伝送線路配線が最高のFoMを達成した.伝送遅延および消費電力の両方に優れる.

In this paper, we investigate on-chip interconnect technologies, and we propose Figure of Merit (FoM) to evaluate delay and power consumption of on-chip interconnects. RC, differential-transmission-line (DTL), carbon-nanotube (CNT), and optical interconnects are evaluated for 90 nm- and 22 nm-technology nodes. The DTL interconnect has superior characteristics to the RC, CNT, and optical interconnections, and the DTL has the best FoM for more than 0.3-mm lines in 22 nm technology.

Journal

Technical report of IEICE. SDM   [List of Volumes]

Technical report of IEICE. SDM 106(525), 45-48, 2007-01-29  [Table of Contents]

The Institute of Electronics, Information and Communication Engineers

References:  12

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Codes

  • NII Article ID (NAID) :
    110006239522
  • NII NACSIS-CAT ID (NCID) :
    AN10013254
  • Text Lang :
    ENG
  • Article Type :
    ART
  • ISSN :
    09135685
  • NDL Article ID :
    8679388
  • NDL Source Classification :
    ZN33(科学技術--電気工学・電気機械工業--電子工学・電気通信)
  • NDL Call No. :
    Z16-940
  • Databases :
    CJP  NDL  NII-ELS 

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