Droplet-Free Thin Films Prepared by Pulsed Laser Deposition Using a Vane Velocity Filter.

  • Yoshitake Tsuyoshi
    Department of Applied Science for Electronics and Materials, Kyushu University, Kasuga, Fukuoka 816-8580, Japan
  • Shiraishi Gousuke
    Department of Applied Science for Electronics and Materials, Kyushu University, Kasuga, Fukuoka 816-8580, Japan
  • Nagayama Kunihito
    Department of Aeronautics and Astronautics, Kyushu University, Hakozaki, Fukuoka 812-8581, Japan

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抄録

Pulsed laser deposition is an effective method of fabricating a large variety of thin films. However, it has a serious disadvantage in that many droplets with diameters of 1-10 μm are deposited together with the ablation species. In order to eliminate droplets, a velocity filter containing many vanes was adopted, by means of which the number of droplets decreased markedly. The velocity distribution of the droplets was obtained for various droplet sizes. The maximum velocity of the droplets is 65 m/s. This shows that it is possible to eliminate the droplets completely at a suitable cutoff velocity of the filter.

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