Droplet-Free Thin Films Prepared by Pulsed Laser Deposition Using a Vane Velocity Filter.
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- Yoshitake Tsuyoshi
- Department of Applied Science for Electronics and Materials, Kyushu University, Kasuga, Fukuoka 816-8580, Japan
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- Shiraishi Gousuke
- Department of Applied Science for Electronics and Materials, Kyushu University, Kasuga, Fukuoka 816-8580, Japan
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- Nagayama Kunihito
- Department of Aeronautics and Astronautics, Kyushu University, Hakozaki, Fukuoka 812-8581, Japan
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抄録
Pulsed laser deposition is an effective method of fabricating a large variety of thin films. However, it has a serious disadvantage in that many droplets with diameters of 1-10 μm are deposited together with the ablation species. In order to eliminate droplets, a velocity filter containing many vanes was adopted, by means of which the number of droplets decreased markedly. The velocity distribution of the droplets was obtained for various droplet sizes. The maximum velocity of the droplets is 65 m/s. This shows that it is possible to eliminate the droplets completely at a suitable cutoff velocity of the filter.
収録刊行物
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- Japanese Journal of Applied Physics
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Japanese Journal of Applied Physics 41 (2A), 836-837, 2002
The Japan Society of Applied Physics
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詳細情報 詳細情報について
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- CRID
- 1390001206255479680
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- NII論文ID
- 210000052461
- 110006340844
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- NII書誌ID
- AA10457675
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- ISSN
- 13474065
- 00214922
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可