Ultraviolet Photon Induced Bulk, Surface and Interface Modifications in n-Hg<sub>0.8</sub>Cd<sub>0.2</sub>Te in Hydrogen Environment
-
- Agnihotri O. P.
- Center for Electro-Optics, Department of Electrical Engneering and Computer Science, Korea Advanced Institute of Science and Technology, Daejeon, Korea
-
- Pal Ravinder
- Solid State Physics Laboratory, Delhi-110054 India
-
- Yang Keedong
- Center for Electro-Optics, Department of Electrical Engneering and Computer Science, Korea Advanced Institute of Science and Technology, Daejeon, Korea
-
- Bae Soo-Ho
- Center for Electro-Optics, Department of Electrical Engneering and Computer Science, Korea Advanced Institute of Science and Technology, Daejeon, Korea
-
- Lee Sang-Jun
- Center for Electro-Optics, Department of Electrical Engneering and Computer Science, Korea Advanced Institute of Science and Technology, Daejeon, Korea
-
- Lee Min-Young
- Center for Electro-Optics, Department of Electrical Engneering and Computer Science, Korea Advanced Institute of Science and Technology, Daejeon, Korea
-
- Choi Woo Seok
- Center for Electro-Optics, Department of Electrical Engneering and Computer Science, Korea Advanced Institute of Science and Technology, Daejeon, Korea
-
- Choi Jong Hwa
- Center for Electro-Optics, Department of Electrical Engneering and Computer Science, Korea Advanced Institute of Science and Technology, Daejeon, Korea
-
- Lee Hee Chul
- Center for Electro-Optics, Department of Electrical Engneering and Computer Science, Korea Advanced Institute of Science and Technology, Daejeon, Korea
-
- Kato Isamu
- Department of Electronics, Information and Communication Engineering and Laboratory for Bio-Science and Photonics, Waseda University, Tokyo, Japan
書誌事項
- タイトル別名
-
- Ultraviolet Photon Induced Bulk, Surface and Interface Modifications in n-Hg0.8Cd0.2Te in Hydrogen Environment.
この論文をさがす
抄録
Ultraviolet photon induced bulk, surface and interface modifications in n-Hg0.8Cd0.2Te (MCT) and metal insulator semiconductor (MIS) structures fabricated from CdTe/n-Hg0.8Cd0.2Te have been investigated in a hydrogen environment. The shift of the absorption edge towards the short wavelength side and the enhancement of the IR transmission in n-Hg0.8Cd0.2Te are thought to be due to the reduction in the density of gap states due to residual impurities or defects. A pre-CdTe deposition surface treatment prevents the surface inversion of n-MCT during CdTe deposition and MIS devices after UV photon excitation show a considerable lowering of the interface charges. X-ray photoelectron spectroscopy profiles of annealed CdTe/n-Hg0.8Cd0.2Te show evidence of interface grading which accounts for the stability of CdTe passivation.
収録刊行物
-
- Japanese Journal of Applied Physics
-
Japanese Journal of Applied Physics 41 (7A), 4500-4502, 2002
The Japan Society of Applied Physics
- Tweet
キーワード
詳細情報 詳細情報について
-
- CRID
- 1390001206255044096
-
- NII論文ID
- 110006341548
- 210000051722
- 130004529913
-
- NII書誌ID
- AA10457675
-
- ISSN
- 13474065
- 00214922
-
- NDL書誌ID
- 6227438
-
- 本文言語コード
- en
-
- データソース種別
-
- JaLC
- NDL
- Crossref
- CiNii Articles
-
- 抄録ライセンスフラグ
- 使用不可