Diamond Deposition on a Large-Area Substrate by Plasma-Assisted Chemical Vapor Deposition Using an Antenna-Type Coaxial Microwave Plasma Generator.

• Taniyama Norikazu

  Micro Denshi Co., Ltd., 2-8-25 Yoshinodai, Kawagoe, Saitama 350-0833, Japan

• Kudo Minoru

  Micro Denshi Co., Ltd., 2-8-25 Yoshinodai, Kawagoe, Saitama 350-0833, Japan

• Matsumoto Osamu

  Department of Chemistry, Aoyama Gakuin University, Chitosedai, Setagaya-ku, Tokyo 157-8572, Japan

• Kawarada Hiroshi

  Department of Electronics, Information and Communication Engineering, Waseda University, 3-4-1 Ohkubo, Shinjuku-ku, Tokyo 169-0072, Japan

抄録

Diamond deposition on a large area silicon wafer substrate (φ 100 mm) is achieved with a methane/hydrogen plasma induced by an antenna-type coaxial microwave plasma generator. Deposition of diamond is observed over the entire substrate. Diamond precursors are emitted radially onto a silicon substrate from the plasma sphere generated at the tip of the antenna. The possibility of diamond deposition outside the plasma sphere is discussed using a semi-empirical equation.

収録刊行物

• Japanese Journal of Applied Physics

  Japanese Journal of Applied Physics 40 (7A), L698-L700, 2001

  The Japan Society of Applied Physics

キーワード

• diamond
• microwave
• plasma
• large area
• deposition
• CVD
• heated substrate
• coaxial cable
• electrode
• ACMPG

詳細情報

• CRID: 1390282681230836992
• NII論文ID: 110006350501
• NII論文ID: 210000050791
• NII論文ID: 130004528757
• NII書誌ID: AA10650595
• DOI: 10.1143/jjap.40.l698
• ISSN: 13474065
• ISSN: 00214922
• ISSN: http://id.crossref.org/issn/13474065
• NDL書誌ID: 5825069
• Web Site: http://id.ndl.go.jp/bib/5825069
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I5825069
• Web Site: https://iopscience.iop.org/article/10.1143/JJAP.40.L698
• Web Site: https://iopscience.iop.org/article/10.1143/JJAP.40.L698/pdf
• 本文言語コード: en
• データソース種別:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
• 抄録ライセンスフラグ: 使用不可