2304 磁気応答流体の新しいポリッシングに関する研究 : 流体からの研磨メカニズムの解明(S42-1 複雑流体の流動現象(1),S42 複雑流体の流動現象)  [in Japanese] 2304 Study on new polishing utilizing magnetic responsive fluid : clarification of polishing mechanism from fluid  [in Japanese]

As a new intelligent fluid, we have proposed a magnetic compound fluid (MCF). This fluid has nm-sized magnetite and μm-sized iron particles in a solvent. In this report, we clarified the polishing mechanism on MCF float polishing. The MCF polishing is fine finishing with nm-order surface roughness and has a large clearance between the polishing tool and the polished specimen. These causes are due to the magnetic clusters in the MCF, the buffer material of α-cellulose and the abrasive particles involved in the clusters.