OA5 シリカガラス中の不純物による新しい緩和過程の発生(基礎・物性)  [in Japanese] OA5 Creation of new relaxations due to impurity in silica glass  [in Japanese]

Journal

Symposium on ultrasonic electronics   [List of Volumes]

Symposium on ultrasonic electronics (18), 117-118, 1997-11-12  [Table of Contents]

Steering committee of symposium on ultrasonic electronics

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Codes

  • NII Article ID (NAID) :
    110007461242
  • NII NACSIS-CAT ID (NCID) :
    AN10578660
  • Text Lang :
    JPN
  • Databases :
    NII-ELS