S055015 PIV Measurements of the Model of a Semiconductor Cleaning Equipment

• SHIMIZU Yoshiya

  Graduate School of Natural Science and Technology, Okayama Univ.

• YANASE Shinichiro

  Graduate School of Natural Science and Technology, Okayama Univ.

• KOUCHI Toshinori

  Graduate School of Natural Science and Technology, Okayama Univ.

• MORI Yohei

  Graduate School of Natural Science and Technology, Okayama Univ.

• FUKUDA Naoya

  Graduate School of Natural Science and Technology, Okayama Univ.

Bibliographic Information

Other Title

• S055015 半導体洗浄機モデル内流れのPIV計測([S055-01]内部流れ(1))

Abstract

The cleaning process of a silicon wafer is important in the manufacturing of semiconductors, which determines the quality of the final products crucially. In the so-called single wafer cleaning, a wafer washed with cleaning solution and rinse liquid is dried up by rotating at a high speed. We made an experimental apparatus which has a similar structure to the single wafer cleaning chamber, and measured the velocity field in the chamber by the particle image velocimetry(PI V) method.

Journal

• The Proceedings of Mechanical Engineering Congress, Japan

  The Proceedings of Mechanical Engineering Congress, Japan 2013 (0), _S055015-1-_S055015-4, 2013

  The Japan Society of Mechanical Engineers

Keywords

• Single Wafer Cleaning
• Semiconductor
• PIV
• Rotation

Details

• CRID: 1390282680816848640
• NII Article ID: 110009934094
• DOI: 10.1299/jsmemecj.2013._s055015-1
• ISSN: 24242667
• Web Site: https://www.jstage.jst.go.jp/article/jsmemecj/2013/0/2013__S055015-1/_pdf
• Text Lang: ja
• Data Source:
  • JaLC
  • Crossref
  • CiNii Articles
• Abstract License Flag: Disallowed