書誌事項
- タイトル別名
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- 10101 Room temperature bonding for MEMS and IC integration
抄録
In the past few decades, many micro-electromechanical systems (MEMS) devices have been developed. To encapsulate a tiny MEMS device into a microcavity, a sealing ring is often used. The sealing ring is fabricated on a cap wafer or on a MEMS substrate by Au electroplating. The electroplated Au surface is rough compared to polished wafer surface. Therefore, high temperature bonding process is often used in order to deform the Au and achieve intimate contact. However, it is expected that Au surface with much smaller roughness can form intimate contact at lower temperatures. In this work, we carried out the room temperature bonding using electroplated Au seal rings smoothed by two different methods. One is a surface smoothing by thermal imprint method using smooth substrate as a master mold. Other is a surface smoothing by lift-off method using a sacrificial layer. Moreover, hermeticity of bonding processes using these smoothed surfaces was evaluated by diaphragm structures, which were prepared by photolithography and dry etching of Silicon-On-Insulator (SOI) substrate. As a result, good hermetic sealing was confirmed using the replicated surface smoothed by lift-off process.
収録刊行物
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- 日本機械学会関東支部総会講演会講演論文集
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日本機械学会関東支部総会講演会講演論文集 2015.21 (0), _10101-1_-_10101-2_, 2015
一般社団法人 日本機械学会
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詳細情報 詳細情報について
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- CRID
- 1390001205846743552
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- NII論文ID
- 110009948141
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- ISSN
- 24242691
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
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- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可