Uniform plasma produced by a plane slotted antenna with magnets for electron cyclotron resonance

• N. Sato

  Department of Electronic Engineering, Tohoku University, Sendai 980, Japan

• S. Iizuka

  Department of Electronic Engineering, Tohoku University, Sendai 980, Japan

• Y. Nakagawa

  Department of Electronic Engineering, Tohoku University, Sendai 980, Japan

• T. Tsukada

  Department of Electronic Engineering, Tohoku University, Sendai 980, Japan

抄録

A uniform plasma is produced by a new plane slotted antenna with permanent magnets for the electron cyclotron resonance. The plasma is uniform within a few percent in a diameter of 25–30 cm at a distance of 25–30 cm from the antenna. The plasma density, 1.5×1010 cm−3 with electron temperature of 1.8 eV at a microwave power of 100 W, is almost proportional to the microwave power. A magnetic distribution provided by the magnets is essential for producing such a uniform plasma.

収録刊行物

• Applied Physics Letters

  Applied Physics Letters 62 (13), 1469-1471, 1993-03-29

  AIP Publishing

キーワード

• Physics and Astronomy (miscellaneous)

詳細情報

• CRID: 1361981470443012992
• NII論文ID: 120000775524
• DOI: 10.1063/1.108661
• ISSN: 10773118
• ISSN: 00036951
• Web Site: https://pubs.aip.org/aip/apl/article-pdf/62/13/1469/18494419/1469_1_online.pdf
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