Single-crystalline 4H-SiC micro cantilevers with a high quality factor

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Single-crystalline 4H-SiC micro cantilevers were fabricated by doping-type selective electrochemical etching of 4H-SiC. Using this method, n-type 4H-SiC cantilevers were fabricated on a p-type 4H-SiC substrate, and resonance characteristics of the fabricated 4H-SiC cantilevers were investigated under a vacuum condition. The resonant frequencies agreed very well with the results of numerical simulations. The maximum quality factor in first-mode resonance of the 4H-SiC cantilevers was 230, 000. This is 10 times higher than the quality factor of conventional 3C-SiC cantilevers fabricated on an Si substrate.

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詳細情報 詳細情報について

  • CRID
    1050845760699976704
  • NII論文ID
    120005245141
  • NII書誌ID
    AA10781039
  • ISSN
    09244247
  • HANDLE
    2433/174329
  • 本文言語コード
    en
  • 資料種別
    journal article
  • データソース種別
    • IRDB
    • CiNii Articles

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