Aluminum bulk micromachining through an anodic oxide mask by electrochemical etching in an acetic acid/perchloric acid solution

• Kikuchi, Tatsuya

• Wachi, Yuhta

• Sakairi, Masatoshi

• Suzuki, Ryosuke O.

抄録

A well-defined microstructure with microchannels and a microchamber was fabricated on an aluminum plate by four steps of a new aluminum bulk micromachining process: anodizing, laser irradiation, electrochemical etching, and ultrasonication. An aluminum specimen was anodized in an oxalic acid solution to form a porous anodic oxide film. The anodized aluminum specimen was irradiated with a pulsed Nd-YAG laser to locally remove the anodic oxide film, and then the exposed aluminum substrate was selectively dissolved by electrochemical etching in an acetic acid/perchloric acid solution. The anodic oxide film showed good insulating properties as a resist mask during electrochemical etching in the solution. A hemicylindrical microgroove with thin free-standing anodic oxide on the groove was fabricated by electrochemical etching, and the groove showed a smooth surface with a calculated mean roughness of 0.2–0.3 μm. The free-standing oxides formed by electrochemical etching were easily removed from the specimen by ultrasonication in an ethanol solution. Microchannels 60 μm in diameter and 25 μm in depth connected to a microchamber were successfully fabricated on the aluminum.

収録刊行物

• Microelectronic Engineering

  Microelectronic Engineering 111 14-20, 2013-11

  Elsevier

キーワード

• Bulk micromachining
• Aluminum
• Anodizing
• Electrochemical etching
• Laser irradiation

詳細情報

• CRID: 1050001339014433024
• NII論文ID: 120005322432
• DOI: 10.1016/j.mee.2013.05.007
• HANDLE: 2115/53124
• ISSN: 01679317
• Web Site: https://api.elsevier.com/content/article/PII:S0167931713004954?httpAccept=text/xml
• Web Site: https://api.elsevier.com/content/article/PII:S0167931713004954?httpAccept=text/plain
• 本文言語コード: en
• 資料種別: journal article
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