Photochemical grafting of methyl groups on a Si(111) surface using a Grignard reagent.

• Herrera, Marvin Ustaris

• Ichii, Takashi

• Murase, Kuniaki

• 杉村, 博之

抄録

The photochemical grafting of methyl groups onto an n-type Si(111) substrate was successfully achieved using a Grignard reagent. The preparation involved illuminating a hydrogen-terminated Si(111) that was immersed in a CH3MgBr-THF solution. The success was attributed to the ability of the n-type hydrogenated substrate to produce holes on its surface when illuminated. The rate of grafting methyl groups onto the silicon surface was higher when a larger illumination intensity or when a substrate with lower dopant concentration was used. In addition, the methylated layer has an atomically flat structure, has a hydrophobic surface, and has electron affinity that was lower than the bulk Si.

収録刊行物

• Journal of colloid and interface science

  Journal of colloid and interface science 411 145-151, 2013-12-01

  Elsevier Inc.

キーワード

• Methyl-terminated Si
• Photochemical grafting
• Grignard reagent
• Self-assembled monolayer

詳細情報

• CRID: 1050001335777956480
• NII論文ID: 120005343916
• NII書誌ID: AA00695804
• ISSN: 00219797
• HANDLE: 2433/179382
• 本文言語コード: en
• 資料種別: journal article
• データソース種別:
  • IRDB
  • CiNii Articles