MgOスパッタ薄膜の構造特性 : 絶縁破壊およびスクラッチ損傷

• 江上 傑

• 村瀬 史弥

• 田端 美咲

• 小曾根 良介

• 中野 武雄

• 馬場 茂

書誌事項

タイトル別名

• MgO スパッタ ハクマク ノ コウゾウ トクセイ : ゼツエン ハカイ オヨビ スクラッチ ソンショウ

抄録

type:Article

Structural properties of magnesium oxide (MgO) thin films are discussed from the dielectric breakdown measurement. Films of MgO of about 80 nm in thickness were prepared by rf-sputtering in an argon atmosphere at pressures of 0.24, 1.32 and 2.85 Pa. The breakdown took place suddenly in a staircase voltage-elevation measurement. Films sputtered at low pressures had a high breakdown strength. We observed a slow breakdown by employing the current-limitation mode, and a characteristic behavior appeared in the I-V profiles. As the current increased, the voltage was apt to decrease in films sputtered at 0.24 Pa, but it increased in films prepared at high pressures. The difference also appeared in the surface morphology of the breakdown points and the mechanical damage of the films in the scratch test. The correlation suggests that the grain boundary structure of MgO films plays an important role on these fracture properties.

identifier:http://repository.seikei.ac.jp/dspace/handle/10928/458

収録刊行物

• 成蹊大学理工学研究報告 = The journal of the Faculty of Science and Technology, Seikei University

  成蹊大学理工学研究報告 = The journal of the Faculty of Science and Technology, Seikei University 50 (2), 27-31, 2013-12-01

  成蹊大学理工学部

キーワード

• MgO
• Dielectric breakdown
• γ-effect
• Scratch failure

詳細情報

• CRID: 1390010292757219200
• NII論文ID: 120005426623
• NII書誌ID: AA1203510X
• ISSN: 18802265
• DOI: 10.15018/00000906
• NDL書誌ID: 025124882
• Web Site: http://hdl.handle.net/10928/458
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I025124882
• 本文言語コード: ja
• データソース種別:
  • JaLC
  • IRDB
  • NDL
  • CiNii Articles