Surface modification using ionic liquid ion beams

• 高岡, 義寛

• Hamaguchi, Takuya

• Takeuchi, Mitsuaki

• Ryuto, Hiromichi

抄録

We developed an ionic liquid (IL) ion source using 1-butyl-3-methylimidazolium hexafluorophosphate (BMIM-PF[6) and produced IL ion beams by applying a hi]gh electric field between the tip and the extractor. Time-of-flight measurements showed that small cluster and fragment ions were contained in the positive and negative ion beams. The positive and negative cluster ions were deposited on Si(1 0 0) substrates. X-ray photoelectron spectroscopy measurements showed that the composition of the deposited layers was similar to that of an IL solvent. This suggests that a cation (A{+}) or an anion (B{−}) was attached to an IL cluster (AB)n, resulting in the formation of positive cluster ions (AB)nA{+} or negative cluster ions (AB)nB{−}, respectively. The surfaces of the IL layers deposited on Si(1 0 0) substrates were flat at an atomic level for positive and negative cluster ion irradiation. Moreover, the contact angles of the deposited layers were similar to that of the IL solvent. Thus, surface modification of Si(1 0 0) substrates was successfully demonstrated with BMIM-PF[6] cluster ion beams.

収録刊行物

• Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

  Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 341 32-36, 2014-12

  Elsevier B.V.

キーワード

• Cluster ions
• Ionic liquid ions
• Polyatomic ions
• Ion beams
• Surface modification

詳細情報

• CRID: 1050564285755813888
• NII論文ID: 120005525679
• NII書誌ID: AA10529980
• ISSN: 0168583X
• HANDLE: 2433/192901
• 本文言語コード: en
• 資料種別: journal article
• データソース種別:
  • IRDB
  • CiNii Articles