Radio frequency wave interactions with a plasma sheath: The role of wave and plasma sheath impedances

• Myra, J. R.

• 河野, 晴彦

抄録

Radio frequency (RF) sheaths form near surfaces where plasma and strong RF fields coexist. The effect of these RF sheaths on wave propagation near the boundary can be characterized by an effective sheath impedance that includes both resistive and capacitive contributions describing RF sheath rectification and RF power absorption in the sheath [J. R. Myra and D. A. D'Ippolito, Phys. Plasmas 22, 062507 (2015)]. Here, we define a dimensionless parameter, the ratio of incoming wave impedance to the sheath impedance, which determines the characteristics of the interaction, ranging from quasi-conducting to quasi-insulating, or in the case of matched impedances, to either perfect absorption or a sheath-plasma resonance. A semi-analytical analysis is carried out for electrostatic slow waves in the ion cyclotron range of frequencies. For the propagating slow wave case, where the incident wave is partially reflected, the fraction of power dissipated in the sheath is calculated. For the evanescent slow wave case, which admits a sheath-plasma resonance, an amplification factor is calculated. Using the impedance ratio approach, RF sheath interactions are characterized for a range of RF wave and plasma parameters including plasma density, magnetic field angle with respect to the surface, wave frequency, and wave-vector components tangent to the surface. For a particularly interesting example case, results are compared with the rfSOL code [H. Kohno and J. R. Myra, Comput. Phys. Commun. 220, 129 (2017)]. Finally, electromagnetic effects, absent from the semi-analytical analysis, are assessed.

Journal Article

収録刊行物

• Physics of Plasmas

  Physics of Plasmas 26 (5), 052503-1-052503-14, 2019-05-08

  AIP Publishing

キーワード

• radio frequency
• ICRF
• sheath
• impedance
• tokamak

詳細情報

• CRID: 1050001202725219584
• NII論文ID: 120006647286
• NII書誌ID: AA10987555
• DOI: 10.1063/1.5088343
• ISSN: 10897674
• ISSN: 1070664X
• HANDLE: 10228/00007255
• Web Site: https://kyutech.repo.nii.ac.jp/records/6045
• Web Site: http://aip.scitation.org/doi/am-pdf/10.1063/1.5088343
• Web Site: https://pubs.aip.org/aip/pop/article-pdf/doi/10.1063/1.5088343/16748384/052503_1_online.pdf
• 本文言語コード: en
• 資料種別: journal article
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