Oxidation of Carbonaceous Particles in Silent Discharge Reactor.
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- Harano Azuchi
- Department of Chemical System Engineering, Faculty of Engineering, The University of Tokyo
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- Murata Kouji
- Department of Chemical System Engineering, Faculty of Engineering, The University of Tokyo
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- Takamizawa Kazuhisa
- Department of Chemical System Engineering, Faculty of Engineering, The University of Tokyo
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- Sadakata Masayoshi
- Department of Chemical System Engineering, Faculty of Engineering, The University of Tokyo
書誌事項
- タイトル別名
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- Oxidation of Carbonaceous Particles in
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The oxidative reaction of OH radicals or O atoms with carbon black (CB) particles is studied by using a silent discharge reactor operated at room temperature and atmospheric pressure. The CB particles are oxidized by OH radicals or O atoms to produce approximately corresponding amounts of CO and CO2 through the silent discharge reactor. The OH radicals and O atoms are generated from the dissociation of H2O and O2 by silent discharge, respectively. The concentration of OH radicals is measured by resonance absorption spectroscopy while that of O atoms is estimated from a computer simulation by taking into consideration molecular dissociative reactions by electron impact.<BR>The amount of CB particles oxidized gradually decreases in the high H2O concentration range in spite of an increase in OH radical concentration. It is considered that the surface reactivity of the CB particles decreases upon adsorption of H2O on their surfaces. On the other hand, the amount of CB particles oxidized with addition of O2 is almost independent of the O2 concentration. The CO and CO2 concentrations produced are correlated with that of O atoms, which is estimated from O3 concentration. These results indicate that the O atoms are much more reactive than the O3 molecules for oxidation of CB particles.<BR>The sticking coefficient for oxidation of CB particles by OH radicals or O atoms is calculated from the experimental results. The OH radicals are more reactive than O atoms when H2O concentration is under 0.6%. However, beyond this value, the sticking coefficient of OH radicals suddenly decreases, and then becomes lower than that of O atoms.
収録刊行物
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- JOURNAL OF CHEMICAL ENGINEERING OF JAPAN
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JOURNAL OF CHEMICAL ENGINEERING OF JAPAN 31 (5), 700-705, 1998
公益社団法人 化学工学会
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詳細情報 詳細情報について
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- CRID
- 1390001204564985088
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- NII論文ID
- 130000020604
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- NII書誌ID
- AA00709658
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- COI
- 1:CAS:528:DyaK1cXntFWqs7c%3D
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- ISSN
- 18811299
- 00219592
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- NDL書誌ID
- 4588674
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
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- 使用不可