A Two-dimensional Anisotropic Wet Etching Simulator for Quartz Crystal

• Zhao Meng

  The Graduate School of Information, Production and Systems, Waseda University

• Wang Jiani

  The Graduate School of Information, Production and Systems, Waseda University

• Oigawa Hiroshi

  The Graduate School of Information, Production and Systems, Waseda University

• Ji Jing

  The Graduate School of Information, Production and Systems, Waseda University

• Hayashi Hisanori

  The Graduate School of Information, Production and Systems, Waseda University

• Ueda Toshitsugu

  The Graduate School of Information, Production and Systems, Waseda University

抄録

We developed an anisotropic wet etching simulator that can predict the etching profile of initial shape, which is two-dimensional and formed by straight lines. New etching rate database of quartz at a special condition was obtained. Improved hull method was used to deal with round corner etching. New programming flow was adopted to avoid improper profile prediction. A friendly graphical user interface was built for user's convenience. The simulation result of this simulator meets well with the experimental results and shows nice accuracy in new emerging faces predicting.

収録刊行物

• 電気学会論文誌Ｅ（センサ・マイクロマシン部門誌）

  電気学会論文誌Ｅ（センサ・マイクロマシン部門誌） 131 (5), 185-188, 2011

  一般社団法人 電気学会

キーワード

• micromaching
• anisotropic etching
• quartz crystal

詳細情報

• CRID: 1390282679438342400
• NII論文ID: 10030532682
• NII書誌ID: AN1052634X
• DOI: 10.1541/ieejsmas.131.185
• BIBCODE: 2011IJTSM.131..185Z
• ISSN: 13475525
• ISSN: 13418939
• NDL書誌ID: 11101315
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I11101315
• Web Site: http://www.jstage.jst.go.jp/article/ieejsmas/131/5/131_5_185/_pdf
• 本文言語コード: en
• データソース種別:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
• 抄録ライセンスフラグ: 使用不可