書誌事項
- タイトル別名
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- Film Thickness Dependence of Nonlinear Optical Intensity and Morphology of Vanadyl-phthalocyanine Thin Film Deposited on KCl (100) Substrate
- エンカ カリウム 100 キバン ジョウ ニ サクセイ サレタ バナジルフタロシアニン ハクマク ノ ケイタイ ト ヒセンケイ コウガク キョウド ノ マクアツ イゾンセイ
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Vanadyl-phthalocyanine (VOPc) thin films were fabricated on KC1 (100) substrate by a molecular beam epitaxy. The morphologies of VOPc thin films fabricated under different preparing conditions were investigated by using Vis/ UV spectra, AFM images and the third order nonlinear optical properties measured with Maker fringe. The morphology of VOPc thin film on a KC1 substrate has three types. The first type has VOPc molecules tilted epitaxially on KC1 substrate, the second type has pseudomorphic VOPc layers on the epitaxial layer, and the third type is the bulk VOPc crystals deposited on the pseudomorphic layer. The third order nonlinear optical susceptibility estimated from a maximum third harmonic intensity of VOPc thin film measured by Maker fringe is about 10-9 esu. This is a practical value requested for the application to optical devices such as optical switching and memory.
収録刊行物
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- 真空
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真空 46 (3), 284-286, 2003
一般社団法人 日本真空学会
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詳細情報
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- CRID
- 1390282679041548672
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- NII論文ID
- 130000864608
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- NII書誌ID
- AN00119871
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- ISSN
- 18809413
- 05598516
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- NDL書誌ID
- 6569059
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可