半導体ＴｉＯ２微粒子配合歯磨剤の臨床応用　う蝕原性細菌との関連性

• 三浦 宏子

  東日本学園大学歯学部口腔衛生学講座

• 磯貝 恵美子

  東日本学園大学歯学部口腔衛生学講座

• 磯貝 浩

  東日本学園大学歯学部口腔解剖学講座

• 脇坂 仁美

  東日本学園大学歯学部口腔衛生学講座

• 上田 五男

  東日本学園大学歯学部口腔衛生学講座

• 井藤 信義

  東日本学園大学歯学部口腔衛生学講座

書誌事項

タイトル別名

• Clinical application of tooth paste containing semi-conductor TiO2 powder. Its relation to cariogenic bacteria.
• Its Relation to Cariogenic Bacteria
• 齲蝕原性細菌との関連性

抄録

We examined changes in S. mutans, lactobacilli, total streptococci, and total anaerobic bacteria counts in plaque and saliva, when college student volunteers used toothpaste containing semiconductor TiO₂, having bactericidal activity for S. mutans in vitro. S. mutans counts of plaque in subjects using toothpaste containing semiconductor TiO₂ (TiO₂ subjects) decreased and more significantly with time decreased than those of subjects using control paste (control subjects) after 2 weeks (p<0.01). Comparison of S. mutans counts between subjects using toothpaste contained TiO₂ without semiconductor effect and control subjects were not significant. Lactobacilli counts of plaque in TiO₂ subjects was also more sxgnificantly decreased than those in control subjects after 2 weeks (p<0.05). Salivary cariogenic bacterial counts were not changed by using toothpaste containing semiconductor TiO₂.<BR>We suggest that toothpaste containg semiconductor TiO₂ effective by to decreases S. mutans in plaque and contributes to the prevention of dental caries.

収録刊行物

• 口腔衛生学会雑誌

  口腔衛生学会雑誌 39 (5), 711-715, 1989

  一般社団法人 口腔衛生学会

キーワード

• 歯磨剤
• 二酸化チタン
• 半導体

詳細情報

• CRID: 1390001205002313984
• NII論文ID: 130001316388
• DOI: 10.5834/jdh.39.711
• ISSN: 21897379
• ISSN: 00232831
• Web Site: https://search.jamas.or.jp/link/ui/1991207874
• 本文言語コード: ja
• データソース種別:
  • JaLC
  • Crossref
  • CiNii Articles
• 抄録ライセンスフラグ: 使用不可