書誌事項
- タイトル別名
-
- CFD Analysis of Flow Structure between Rotating Disks for Semiconductor Photoresist Stripping Using High Concentrated Ozone Water
抄録
In the photoresist stripping process of semiconductor manufacturing, the cleaning method with the ozone water and a disk-shaped nozzle is proposed in authors' previous studies. Moreover, it is suggested that the three-dimensional flow structure of the ozone water between a rotating silicon wafer and the disk-shaped nozzle affects photoresist stripping rate. The purpose of the present study is to reveal this flow structure. In order to reveal this flow structure, the visualization experiment with dye, stereoscopic micro-PTV measurement and CFD analysis are conducted. As a result, the injected dye forms contrasting density, and a high concentrated area is indicated near the disk end. On the other hand, CFD analysis is conducted with 5 models ; laminar model, k-ε model, Lam-Bremhorst k-ε model (1981), Launder-Sharma k-ε model (1974) and Lien-Leschziner k-ε model (1999). The result suggests that Lien-Leschziner k-ε is the most appropriate model for the present study. It is cleared that there is a transition radius of flow structure. It is suggested that the transition radius also depends on the balance between the inertial force and the force caused by the adverse pressure gradient. Furthermore, the photoresist stripping rate increases where the wall shear stress is strong. As a result, it is suggested that the wall shear stress affects the rate of photoresist stripping.
収録刊行物
-
- 日本機械学会論文集B編
-
日本機械学会論文集B編 79 (806), 1900-1914, 2013
一般社団法人 日本機械学会
- Tweet
詳細情報 詳細情報について
-
- CRID
- 1390282681238190720
-
- NII論文ID
- 130003386295
-
- ISSN
- 18848346
- 03875016
-
- 本文言語コード
- ja
-
- データソース種別
-
- JaLC
- Crossref
- CiNii Articles
-
- 抄録ライセンスフラグ
- 使用不可