Scattering Mechanism in Heavily Doped Semiconductors. I. Maxima in Resistivity and Hall Coefficient
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- Saso Tetsuro
- Department of Physics, Faculty of Science, University of Tohoku
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- Kasuya Tadao
- Department of Physics, Faculty of Science, University of Tohoku
抄録
Resistivities and Hall coefficients of heavily doped semiconductors in the metallic concentration range, especially of Sb-doped Ge and P-doped Si, are investigated by the degenerate electron gas model with impurity scattering. The maxima of resistivity and Hall coefficient are explained by strong temperature variation of the screening length, which is due to the smallness of the Fermi temperature TF in the present systems (TF∼100 K). The shapes of the screened impurity potentials and the scattering of electrons by them are investigated in detail by the nonlinear Hartree approximation, the Kohn-Sham density functional formalism and the random phase approximation with valley multiplicity. Including nonlinearity of screening and many-body effect, we obtain the values of resistivity which agree very well with experiments for the higher concentration samples of the metallic range.
収録刊行物
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- Journal of the Physical Society of Japan
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Journal of the Physical Society of Japan 48 (5), 1566-1575, 1980
一般社団法人 日本物理学会
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詳細情報 詳細情報について
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- CRID
- 1390282679159743104
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- NII論文ID
- 210000088482
- 130003737993
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- BIBCODE
- 1980JPSJ...48.1566S
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- COI
- 1:CAS:528:DyaL3cXksF2jsrg%3D
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- ISSN
- 13474073
- 00319015
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可