書誌事項
- タイトル別名
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- Application of Nonequilibrium Plasma Chemical Reactions Using Pulsed Silent Discharge to Efficient Generation of Active Oxygen Species.
- ホウケイハ パルス ムセイ ホウデン オ モチイタ ヒ ヘイコウ プラズマ カ
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抄録
Oxygen atoms play a very importtant role in the atomospheric chemical vapor deposition of silicon dioxide films using tetraethylorthosilicate (TEOS) and ozone. In this study, the efficient generation of active oxygen species included these oxygen atoms has been carried out by use of pulsed silent discharge utilizing fast rising voltage. Discharge and generation characteristics of ozone. which is one of active oxygen species, have been measured experimentally. Generation characteristics of other active oxygen species have been estimated by chemical reaction simulation. As a result, it has been clarified that pulsed silent discharge can achieve highly nonequilibrium plasma conditions and generate active oxygen species efficiently.
収録刊行物
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- 日本機械学会論文集B編
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日本機械学会論文集B編 63 (609), 1720-1727, 1997
一般社団法人 日本機械学会
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詳細情報 詳細情報について
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- CRID
- 1390282680870998912
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- NII論文ID
- 130004079963
- 110002396379
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- NII書誌ID
- AN00187441
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- ISSN
- 18848346
- 03875016
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- NDL書誌ID
- 4215531
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可