真空技術　　超高／極高真空の実現と計測技術

• 一村 信吾

  電子技術総合研究所

書誌事項

タイトル別名

• Realization and measurement method of UHV/XHVcondition.

抄録

Curent technologies to establish UHV and XHV conditions and present methods to measure UHV/XHV conditions were summarized and discussed. From the view point of UHV/XHV genetarion, the importance of controlling outgassing from vacuum chambers was first explained based on the equation of evacuation. Then several methods effective to reduce the outgassing rate were introduced. Those methods are application of electrochemical polishing, vacuum pre-baking, BN and TiN coating on SUS, and also the adoption of other materials than SUS such as aluminum and copper. The outgassing from pumping system and also the reduction of it were also discussed. As to UHV/XHV measurement, several principal problems associated with XHV measurement were first discussed, which were followed by the introduction of new XHV gauges and new measurement methods developed to overcome those problems.

収録刊行物

• 圧力技術

  圧力技術 38 (2), 73-84, 2000

  一般社団法人 日本高圧力技術協会

詳細情報

• CRID: 1390001204617786752
• NII論文ID: 130004259873
• DOI: 10.11181/hpi1972.38.73
• ISSN: 13479598
• ISSN: 03870154
• 本文言語コード: ja
• データソース種別:
  • JaLC
  • CiNii Articles
• 抄録ライセンスフラグ: 使用不可