Microstructure and Dielectric Properties of Barium Titanate Film Prepared by MOCVD

• Tohma Tetsuro

  Institute for Materials Research, Tohoku University

• Masumoto Hiroshi

  Institute for Materials Research, Tohoku University

• Goto Takashi

  Institute for Materials Research, Tohoku University

抄録

Barium titanate (BaTiO₃) films were prepared on (100)Pt/(100)MgO substrates by metal-organic chemical vapor deposition (MOCVD). The effects of deposition temperature (T_dep) and O₂ partial pressure (P_O<SUB>2</SUB>) on the microstructure and dielectric properties of the films were investigated. The BaTiO₃ films prepared at T_dep=873 K showed a randomly orientated granular structure, while those prepared at T_dep=973 K showed a significant (001) orientation with a columnar structure. The grain size was strongly affected by P_O<SUB>2</SUB> and showed the maximum at P_O<SUB>2</SUB>=66 to 93 Pa. The dielectric constant increased from 93 to 640 with increasing grain size from 20 to 130 nm, showing a broad peak at 350 to 380 K.

収録刊行物

• MATERIALS TRANSACTIONS

  MATERIALS TRANSACTIONS 43 (11), 2880-2884, 2002

  公益社団法人 日本金属学会

キーワード

• barium titanate
• metal-organic chemical vapor deposition
• film
• microstructure
• dielectric constant
• grain size

詳細情報

• CRID: 1390001204246312576
• NII論文ID: 130004451738
• NII論文ID: 10012328339
• NII書誌ID: AA1151294X
• DOI: 10.2320/matertrans.43.2880
• COI: 1:CAS:528:DC%2BD3sXjtFKh
• ISSN: 13475320
• ISSN: 13459678
• NDL書誌ID: 6367579
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I6367579
• Web Site: https://www.jstage.jst.go.jp/article/matertrans/43/11/43_11_2880/_pdf
• 本文言語コード: en
• データソース種別:
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  • NDL
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• 抄録ライセンスフラグ: 使用不可