Characteristics of Material for Photoresist Spin Coating: Property for Reduction of Photoresist Consumption.

DOI Web Site Web Site Web Site 被引用文献5件 参考文献9件
  • Sanada Masakazu
    Spinner Fundamental Technology R&D Group, Research and Development Department, Electronics Equipment Division, Dainippon Screen Mfg. Co. Ltd., 322, Furukawa–cho, Hazukashi, Fushimi–ku, Kyoto 612–8486, Japan
  • Nakano Kayoko
    Spinner Fundamental Technology R&D Group, Research and Development Department, Electronics Equipment Division, Dainippon Screen Mfg. Co. Ltd., 322, Furukawa–cho, Hazukashi, Fushimi–ku, Kyoto 612–8486, Japan
  • Matsunaga Minobu
    Spinner Fundamental Technology R&D Group, Research and Development Department, Electronics Equipment Division, Dainippon Screen Mfg. Co. Ltd., 322, Furukawa–cho, Hazukashi, Fushimi–ku, Kyoto 612–8486, Japan

書誌事項

タイトル別名
  • Characteristics of Material for Photoresist Spin Coating

この論文をさがす

抄録

The spin coating property for the reduction of the photoresist consumption was investigated experimentally using photoresist samples systematically. Dry film thickness D is affected by spin velocity ω : D=kω -1/2, where k is a constant. The photoresist samples can be characterized by a constant k irrespective of their composition. The same k photoresist results in the same consumption when the prespin velocity is optimized for reducing the consumption. The consumption is reduced as k becomes smaller. In the case where the prespin velocity is fixed, the consumption becomes smaller for the sample for which the solvent viscosity is small and the solvent evaporation rate is large.

収録刊行物

被引用文献 (5)*注記

もっと見る

参考文献 (9)*注記

もっと見る

キーワード

詳細情報 詳細情報について

問題の指摘

ページトップへ