Lithography Process Simulations using OCTA -Application to Development and DSA

• Morita Hiroshi

  Nanosystem Research Inst., National Institute of Advanced Industrial Science and Technology (AIST)

抄録

In 2002, the simulation software system for high functional polymeric material OCTA is released. OCTA is the general purpose simulator and each multi-scale-level simulation can be easily done. Recently, we have applied our OCTA system to the problems of lithography. In this paper we discuss the applicability of OCTA system to the simulations for lithography. Two kinds of applicability are discussed. One is the development and the rinse process simulations, and another is the directed self assembly simulation. In the former study, LER can be discussed using OCTA simulation. In the latter study, many kinds of coarse-grained models can be applicable for the DSA simulation using OCTA. These wide applicability are discussed in this paper.

収録刊行物

• Journal of Photopolymer Science and Technology

  Journal of Photopolymer Science and Technology 27 (1), 25-29, 2014

  フォトポリマー学会

キーワード

• OCTA
• Dissipative particle dynamics
• density biased Monte Carlo

詳細情報

• CRID: 1390282679301543040
• NII論文ID: 130004678313
• NII書誌ID: AA11576862
• DOI: 10.2494/photopolymer.27.25
• ISSN: 13496336
• ISSN: 09149244
• NDL書誌ID: 025604244
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I025604244
• Web Site: https://www.jstage.jst.go.jp/article/photopolymer/27/1/27_25/_pdf
• 本文言語コード: en
• データソース種別:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
• 抄録ライセンスフラグ: 使用不可