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- 有馬 健太
- 大阪大学大学院工学研究科精密科学・応用物理学専攻
書誌事項
- タイトル別名
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- Observation of Adsorbed Water on Ultrathin GeO<sub>2</sub>/Ge(100) by Ambient-Pressure X-ray Photoelectron Spectroscopy (AP-XPS)
- 極薄GeO₂/Ge(100)上に形成された吸着水の準大気圧下でのX線光電子分光観察
- ゴクウス GeO ₂/Ge(100)ウエ ニ ケイセイ サレタ キュウチャクスイ ノ ジュンタイキ アッカ デ ノ Xセン コウデンシ ブンコウ カンサツ
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抄録
Germanium oxide (GeO2) is one of the key materials in Ge-based transistors. However, GeO2 is permeable and soluble in water, unlike the more familiar silicon oxide (SiO2). This implies that GeO2 films will react with water vapor in air. In this review, water growth on ultrathin GeO2 films on a Ge(100) substrate as well as the effect of water layers on the electronic properties of GeO2 films are investigated by ambient-pressure X-ray photoelectron spectroscopy (AP-XPS) at relative humidities (RHs) from 0% to approximately 45%. After the basic concept of AP-XPS, as well as its experimental setup, is explained, I show that water adsorbs at low RHs and continues to grow gradually up to approximately 1% RH, and probably forms hydroxyls. Water grows rapidly above 1% RH, indicative of the formation of a molecular water film. In addition, AP-XPS spectra reveal anomalous positive charging of the GeO2 film starting at a very low RH of around 10−6%, and its mechanism is discussed.<br>
収録刊行物
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- Journal of the Vacuum Society of Japan
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Journal of the Vacuum Society of Japan 58 (1), 20-26, 2015
一般社団法人 日本真空学会
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詳細情報
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- CRID
- 1390282680270880384
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- NII論文ID
- 130004952533
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- NII書誌ID
- AA12298652
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- ISSN
- 18824749
- 18822398
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- NDL書誌ID
- 026027130
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- NDL
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- 使用不可