Solid-Liquid Interdiffusion Bonding of Copper Using Ag-Sn Layered Films
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- Fukumoto S.
- Graduate School of Engineering, Osaka University
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- Miyake K.
- Graduate School of Engineering, Osaka University
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- Tatara S.
- Graduate School of Engineering, Osaka University
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- Matsushima M.
- Graduate School of Engineering, Osaka University
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- Fujimoto K.
- Graduate School of Engineering, Osaka University
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Newly developed bonded materials and fabrication processes are expected to firmly bond copper leads to SiC chips for application in next generation power modules. Solid-liquid interdiffusion bonding of copper was performed using Ag-Sn layered films. Microstructural development and mechanical properties of bond layers were investigated. The bond layer grew at the thin film interfaces because of the solid-liquid interdiffusion. Cu6Sn5 and Ag4Sn or Ag3Sn phases were formed at the initial bonding stage, and subsequently, Cu3Sn formed between the Cu6Sn5 and Cu as both bond time and temperature increased. Finally, the bond layer was primarily composed of Ag4Sn and Cu3Sn. The hardness and Young’s modulus of Ag4Sn were much lower than those of Cu3Sn. The growth of the Cu3Sn layer that formed between Ag4Sn and Cu could be limited by optimizing the design of the faying surface.
収録刊行物
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- MATERIALS TRANSACTIONS
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MATERIALS TRANSACTIONS 56 (7), 1019-1024, 2015
公益社団法人 日本金属学会
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詳細情報 詳細情報について
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- CRID
- 1390282679230255872
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- NII論文ID
- 130005083564
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- NII書誌ID
- AA1151294X
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- ISSN
- 13475320
- 13459678
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- NDL書誌ID
- 026564663
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
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- KAKEN
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- 使用不可