Synthesis and Resist Properties of Hyperbranched Polyacetals

• Kudo Hiroto

  Department of Chemistry and Materials Engineering, Faculty of Chemistry, Materials and Bioengineering, Kansai University

• Matsubara Shuhei

  Department of Chemistry and Materials Engineering, Faculty of Chemistry, Materials and Bioengineering, Kansai University

• Yamamoto Hiroki

  Institute of Scientific and Industrial Research, Osaka University

• Kozawa Takahiro

  Institute of Scientific and Industrial Research, Osaka University

抄録

The synthesized noria-AD offered 40 nm resolution resist pattern with LWR = 9.5 nm in the case of EB exposure tool and a clear 26 nm resolution pattern with LWR = 8.3 nm by means of EUV exposure tool. These results indicate that the present poly(THPE-co-BVOC) would have higher potential to offer higher resolution pattern using EUV lithography system.

収録刊行物

• Journal of Photopolymer Science and Technology

  Journal of Photopolymer Science and Technology 28 (1), 125-129, 2015

  フォトポリマー学会

キーワード

• hyperbranched polyacetal
• electron beam
• extreme ultraviolet
• resist

詳細情報

• CRID: 1390001204325974528
• NII論文ID: 130005090250
• NII書誌ID: AA11576862
• DOI: 10.2494/photopolymer.28.125
• ISSN: 13496336
• ISSN: 09149244
• HANDLE: 10112/11219
• NDL書誌ID: 026579305
• Web Site: https://kansai-u.repo.nii.ac.jp/records/11514
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I026579305
• Web Site: https://www.jstage.jst.go.jp/article/photopolymer/28/1/28_125/_pdf
• 本文言語コード: en
• データソース種別:
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  • IRDB
  • NDL
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  • CiNii Articles
• 抄録ライセンスフラグ: 使用不可