The Photopolymer Science and Technology Award

• Ober Christopher Kemper

  Cornell University

抄録

The Photopolymer Science and Technology Award No.151100, the Outstanding Achievement Award 2015, was presented to Christopher Kemper Ober (Cornell University) for his outstanding achievements in photopolymer science and technology, “Development of new advanced photoresist for microelectronics”

収録刊行物

• Journal of Photopolymer Science and Technology

  Journal of Photopolymer Science and Technology 28 (1), 3-4, 2015

  フォトポリマー学会

キーワード

• Outstanding achievement award
• PST award
• EUV Resists
• ArF resists

詳細情報

• CRID: 1390001204325986048
• NII論文ID: 130005090256
• DOI: 10.2494/photopolymer.28.3
• ISSN: 13496336
• ISSN: 09149244
• Web Site: https://www.jstage.jst.go.jp/article/photopolymer/28/1/28_3/_pdf
• 本文言語コード: en
• データソース種別:
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  • Crossref
  • CiNii Articles
• 抄録ライセンスフラグ: 使用不可