Photobase Generators Liberating Two Bases by Absorbing One Photon and Their Application to Photosensitive Materials

• Arimitsu Koji

  Department of Pure and Applied Chemistry, Faculty of Science and Technology, Tokyo University of Science

• Maruyama Yuya

  Department of Pure and Applied Chemistry, Faculty of Science and Technology, Tokyo University of Science

• Furutani Masahiro

  Department of Pure and Applied Chemistry, Faculty of Science and Technology, Tokyo University of Science

抄録

We propose a photobase generator (PBG) that liberates two bases by absorbing one photon. Phototriggered decarboxylation proceeds first to generate one base, and subsequently the unstable reaction intermediate is thermally decarboxylated to generate another base. It was found that the photosensitivity of poly(glycidyl methacrylate) films containing the PBG is much higher than that of films containing a conventional PBG that generates one base by absorbing one photon.

収録刊行物

• Chemistry Letters

  Chemistry Letters 44 (9), 1194-1196, 2015

  公益社団法人 日本化学会

キーワード

• General Chemistry

詳細情報

• CRID: 1390001204586969728
• NII論文ID: 130005096873
• DOI: 10.1246/cl.150405
• ISSN: 13480715
• ISSN: 03667022
• Web Site: https://academic.oup.com/chemlett/article-pdf/44/9/1194/55637919/cl.150405.pdf
• 本文言語コード: en
• データソース種別:
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