Design and Fabrication of Wire Grid Polarizer by Nanoimprinting and Glancing Angle Deposition Processes

• Jang Hyungjun

  School of Mechanical Engineering, Chung-Ang University

• Shin Ga-Young

  School of Mechanical Engineering, Chung-Ang University

• Jang Ho-Young

  School of Mechanical Engineering, Chung-Ang University

• Ju Jonghyun

  School of Mechanical Engineering, Chung-Ang University

• Lim Jiseok

  School of Mechanical Engineering, Yeungnam University

• Kim Seok-min

  School of Mechanical Engineering, Chung-Ang University

抄録

We report a simple and cost-effective fabrication method for a wire grid polarizer. The wire grid polarizer was fabricated by incorporating UV nanoimprinting and glancing angle deposition processes. A silicon pattern with a 40 nm line width, 100 nm pitch, and 100 nm height was fabricated by electron beam (E-beam) lithography and reactive ion etching processes. The UV nanoimprinting process was performed on a glass substrate and aluminum nanowires, with a height of 70 nm, were subsequently generated with a glancing angle deposition process. P-polarization transmittance above 55% and an extinction ratio of 31.1～6.1 were measured in the visible wavelength range.

収録刊行物

• MATERIALS TRANSACTIONS

  MATERIALS TRANSACTIONS 58 (3), 494-498, 2017

  公益社団法人 日本金属学会

キーワード

• wire grid polarizer
• nano metal wire fabrication
• glancing angle deposition
• ultraviolet nanoimprinting

詳細情報

• CRID: 1390001204254056448
• NII論文ID: 130005397715
• NII書誌ID: AA1151294X
• DOI: 10.2320/matertrans.m2016219
• ISSN: 13475320
• ISSN: 13459678
• NDL書誌ID: 028017653
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I028017653
• Web Site: https://www.jstage.jst.go.jp/article/matertrans/58/3/58_M2016219/_pdf
• 本文言語コード: en
• データソース種別:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
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